Analysis of a Thermal Plasma Diamond CVD System
DOI:
https://doi.org/10.14311/250Keywords:
modeling, thermal plasma, CVDAbstract
This paper deals with the analysis of a typical engineering system utilizing thermal plasma - a system for Diamond Chemical Vapor Deposition. It defines the system - a slightly overexpanded plasma jet impinging at a downstream -located substrate, outlines the theoretical description of the system - the Navier-Stokes and species conservation equations, and presents key theoretical results on the major and most troublesome factors influencing diamond deposition - velocity and temperature of the jet. Then, the paper demostrates the necessity to shift from a laminar to a turbulent flow description and compares both results to experiments. An explanation of the remaining discrepancy - insufficient velocity drop in the jet - is attempted.Downloads
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